M. Sc. Maximilian Albert, AG C. Meier:
What is the challenge of my research project? Why am I eager to do it?
I became a part of C. Meier’s research group shortly before the start of the first funding period, first as a bachelor student. Later, I stayed on for my master thesis, where I gained a lot of knowledge in molecular beam epitaxy and thin film characterization techniques such as spectroscopic ellipsometry. During that time, I learned a lot about semiconductor growth and related analysis, which I find highly interesting, leading me to the decision to apply for a PhD position. The focus of my research now is the improvement of our semiconductor growth processes. Important aspects will be ZnO homoepitaxy on differently oriented substrates, as well as the fabrication of low-dimensional systems such as quantum wells, to enable new possibilities for the fabrication of nonlinear photonic nanostructures. In order to achieve the highest quality and reproducibility, I will use a new optical in-situ temperature- and growth rate measurement system.
Why did I choose this project?
This project requires a high degree of technical expertise on the fabrication side as well as on the analysis side. The fabrication of low-dimensional heterostructures and corresponding nanostructures demands a lot of precision. In my opinion, ZnO has - combined with our group’s expertise in the fabrication of resonant nanostructures - a huge potential as a nonlinear semiconducting material.